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Electron Beam Power Supplies & Evaporation Controllers
Electron Beam
Power Supplies &
Evaporation Controllers Ferrotec offers a full range of high quality, state-of-the-art electron beam
evaporation products for the vacuum and thin film industry. These are
developed and manufactured at Ferrotecs European headquarters in
Germany. This modern facility is DIN EN ISO9001 certified to ensure high
and consistent quality. Ferrotecs global organization provides sales and
service on a local level, with Ferrotec companies and representative locati-
ons around the world and full sales and service capability in the US.
Ferrotec provides a full range of electron beam evaporation products including
Single and multihearth evap o ra tors
High voltage power sup plies from 3 kW to 12 kW
Industry leading programmable control units
A complete line of vacuum feedthroughs and accessories for in stal la tion and
au to mat ic operation.
Electron Beam Products
by Ferrotec GmbH Manufactured at Ferrotec´s European
headquarters with 3 000 m² facility All products, including electronics,
developed and tested in-house Worldwide sales & service network
through Ferrotec companies and repre-
sentatives Vacuum laboratory and test center Training facilities DIN EN ISO9001 certified
Ferrotec offers competent support through our
sales organization and the newly established
technical electron beam center in Germany.
Training seminars for all Ferrotec products can
be offered including hands-on practice in our
vacuum laboratory.
All electron beam products are thoroughly tested
on test benches and attached to a vacuum
chamber to perform power tests in a real vacu-
um environment.
A complete power supply system for electron beam evaporation consists of:
CARRERA High Voltage Power Supply
to accelerate the electrons and to deliver the beam power
FPS Filament Power Supply
to create the heating current for thermionic emission
GENIUS Evaporation Controller
to control all evaporation parameters and to sweep the beam Electron Beam
High Voltage Power Supplies
CARRERA 3
CARRERA 5/6
CARRERA 10/12
The CARRERA high voltage power supply is
extremely compact in size. By incorporating pri-
mary switched technology the power efficiency
of this small unit is as high as 90%. The fast and
tight regulation of the high voltage makes the
CARRERA ideal for harsh conditions of vacuum
applications.
The new modular design allows the CARRERA
to be configured for applications over a wide
power range from 3 kW to 12 kW.
An optional built-in high voltage vacuum relay
enables the unit to select an additional HV out-
put e.g. to drive a glow discharge electrode.
Arc Management
Through a combination of an intelligent arc
recognition system and the high switching
frequency of the power unit, arcs are
extinguished extremely fast. This minimizes the
energy that would otherwise continue to feed the
arc. Full power is returned within 3 to 5 ms to
allow the evaporation process to continue.
The built-in arc management also supports
processes with continuous arcing by either
setting an arc rate threshold or by automatically
switching into a robust recovery mode.
Ferrotec´s CARRERA series of high voltage power supplies, together
with the GENIUS evaporation controller, is ideally suited for use in
production and R&D evaporation systems. A flexible range of modular
elements allows almost all system configurations to benefit from this
state of the art technology. These range from simple low power, sin-
gle hearth laboratory systems, to complex production systems where
simultaneous high power deposition from up to three multihearth evap-
orators may be required.
CARRERA
High Voltage Power Supply Output power from 3 kW to 12 kW Sequential or simultaneous supply for up
to three evaporators Robust primary switched mode power
supply Arc detection within 200 ns and sup-
pression within 1 µs Full arc recovery within 5 ms Controllable arc management system
that withstands continuous arcing Continuously variable high voltage from
2 kV to 10 kV Up to 4 HV outputs for parallel operation Switchable HV output for glow discharge
process (optional) Compact and lightweight design CE certified
Typical high voltage recovery after an arc
The CARRERA power supply incorporates
a separate interface board which can be
exchanged with different system configurations.
For example, a power supply for remote operati-
on also includes the filament-emission regulation
and interlock circuit protection on board. The
interface can even be designed pin-compatible
to exisiting power supplies from other manufac-
turers.
Flexible Interfacing The programmable GENIUS evaporation controller regulates all aspects
of the electron beam deposition proc ess. As well as controlling the high
voltage and regulating the filament supply, the GENIUS also handles the
magnet current supply to the coils of the electron beam evaporator.
Menu access /
error ac knowl edge ment
Joysticks for menu
and beam control
Emission current
adjustment
Active pocket and material
Active data set
Sweep display
High
voltage
Emission
current
All of the GENIUS functions are accessible from the handheld re mote control
which can be used to man u al ly control the evaporation process as well as to set
all process and system para meters.
Access to the menu functions may be limited with three password protected user
levels (e.g. Operator, Standard, Service).
GENIUS
Evaporation Controller Full menu driven programming and
control Hand held remote control featuring
LCD display and joystick control Factory defined beam sweep & control
programmes and additional user
programmable options Compatible with virtually all makes of
electron beam evaporator and thick-
ness controller Integrated hearth control (optional) RS232, LAN and A/D interfaces CE certified
Electron Beam
Evaporation Controller
GENIUS
GENIUS Pro
Functionality of GENIUS controller Emission control High voltage control Filament current control Programmable sweep control with
bipolar power output Pocket control for DC and stepper
motors Sequential evaporation control Functional interlock circuit protection External I/O control e.g. shutter control Evaporation data storage Monitor for digital I/Os Logical I/O addressing Master-Slave mode for simultaneous
evaporation All functions can be accessed from the unique
menu driven GENIUS remote control
Data sets containing evaporation parameters can either be associated to an
individual hearth or stored in memory for external assignment. Utilizing the I/O
card it is possible to choose a particular data set dependent upon a signal
from a deposition rate con trol ler.
For each data set the following parameters are defined and saved: Magnet deflection (position, amplitude, fre quen cy, waveform, beam spot,
limits) High voltage Safety limits (emission current limit and resolution for automatic operation)
The waveform can be set independently in both X and the Y axis. This
enables an os cil la tion pat tern de fined by 32 coordinate positions to be estab-
lished. This allows compensation for var i a tions in the en er gy dis tri bu tion to
the hearth.
In order to achieve optimum film quality and uniform evaporant utiliza-
tion, the GEN IUS can store a wide variety of evaporation pa ram e ters
including sweep parameters, high voltage values or safety limits. Up to
99 different data sets can be stored and these may then be ap plied to
dif fer ent phases of the process (e.g. material melting and various coating
phases).
Material Specific Evaporation Parameters
The GENIUS already includes various modes to
deflect the electron beam of an evaporator. The
GENIUS PRO offers additional beam sweep and
defocusing capabilities. For example, by applying
the spiral and circle patterns, di e lec tric mate-
rials can be more homogenously evap o rat ed.
Lissajous mode
Spiral mode
Circle mode with
sector adaptation and
dynamic defocus
Dwell matrix mode
A unique feature of the GENIUS PRO is the dwell
matrix functionality. It al lows in di vid u al energy
con trol at eve ry po si tion of the cru ci ble. A dwell
time pattern de ter mines the energy dis tri bu tion
of the electron beam on the pock et surface and
thus the removal of the evaporation material.
Star mode
Pocket Selection
Waveform Editor
Setting of evaporation parameters
I/O Monitoring
All digital inputs and outputs of the G