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IG2 Ion Source Package
RBD Instruments IG2 Ion Source Package is the ideal solution for sputter clean-
ing of samples under UHV conditions. The IG2 Ion Source Package consists of the
Model 04-165 2 kV Backfill Ion Source and the Model 32-165 Ion Source Control.
These units are interchangeable with the PHI
®
04-161 and 04-162 ion guns and the
PHI
®
20-045 control, respectively.
The Model 04-165 Backfill Ion Source generates an energetic inert gas ion beam for
sputter-etching solid surfaces. The source requires a static pressure of 5x10
-5
torr
with an inert gas such as argon. Ions are generated by electron impact within the
ion sources dual filament ionization chamber and are then focused at the target with
energies of up to 2 kV. The impurity content of the ion beam is minimized by using
an off-axis filament geometry. A focusing lens permits high ion current density to be
obtained for a given operating pressure and source-to-sample distance. A dual tung-
sten filament assembly permits continued operation when the first filament opens.
The expected lifetime of the filament assembly is several years under normal usage
at the recommended operating conditions. The filament assembly is easily replaced
in the field.
The Model 32-165 2 kV Ion Source Control provides all the necessary voltages and
currents required to operate the Model 04-165 2 kV Backfill Ion Source. The beam
voltage may be activated manually, remotely, or with the built-in timer. Additionally,
the anode (ion) and filament currents as well as the beam and focus voltages may
be externally monitored to ensure accurate reproduction of sputtering conditions.
2 kV Backfill Ion Source and Control
Unique 04-165 Features Fits on standard 2.75" flange (1.35" ID tube; 1.5" OD) Designed for easy maintenance
Unique 32-165 Features Built-in timer for sputtering Hour meter to track filament lifetime
IG2 Ion Source Package
Description
Advantages 04-165 Backfill Ion Source and 32-165 Ion Source Control
04-165
Specifications
2437 NE Twin Knolls Drive Suite 2 Bend, Oregon 97701
Phone: 541.330.0723 Fax: 541.330.0991
email: sales@rbdinstruments.com
web: www.rbdinstruments.com
32-165
Specifications
Source Type ...............................................................Hot filament electron impact

(dual filament, backfill type)
Beam Energy..............................................................0.5 to 2 kV
Beam Diameter
at 25 mm working distance ..........................................2.5 mm FWHM (at target)
at 50 mm working distance ..........................................3.5 mm FWHM (at target)
Maximum Total Target Current .................................10 µA at V
B
= 2 kV.
Current Density
at 25 mm working distance ..........................................200 µA/cm
2
when V
B
= 2 kV,

Emission Current = 30 mA
at 50 mm working distance ..........................................100 µA/cm
2
when V
B
= 2 kV,

Emission Current = 30 mA
Mounting ....................................................................Standard 70 mm (2.75") CF bored flange OD,

approx. 34.3 mm (1.35") ID minimum tube

required
Flange to End of Optics ............................................7.00" or 9.25" (2.25 less with optional

x-y aligner)
Working Distance ......................................................Typically 50 mm (2.00") end-of-optics-to-target
Input Power ................................................................90-264 VAC @ 47-63 Hz, single phase
Beam Supply Voltage ................................................500 to 2000 V in 500 V increments
Controls
Beam Control...............................................................Manual, Timer, Remote (TTL high on)
Beam Voltage ..............................................................4-position switch
Focus Voltage ..............................................................5-turn potentiometer
Filament Current ..........................................................5-turn potentiometer
Timer ...........................................................................1-turn potentiometer (0-60 min.)
Front Panel Monitors
Beam ...........................................................................0 to 4 V corresponds to 0 to 2 kV
Focus ...........................................................................0 to 4 V corresponds to 0 to 2 kV

(referenced to V
B
)
Filament .......................................................................0 to 5 V corresponds to 0 to 2.6 A
Anode Current .............................................................0 to 5 V corresponds to 0 to 100 µA
Cooling .......................................................................Convection
Dimensions ................................................................19" rack mount x 14" deep x 3" high
All Specifications are subject to change without notice.