ooled power
conversion and
control systems
8 to 15 kW
MDX Series
Power conversion
and control systems
500 W to 80 kW
Pinnacle
�
Plus+ Series
Pinnacle with
internal pulsing
5 to 60 kW
Reactive sputtering,
bias, PVD
DC Pulsing Products
DC supply pulsing
accessories
500 W to 480 kW
E'Wave
�
Supply
Bipolar pulsed DC
2 or 3 channels;
up to 2 kW each
Electroplating
High Power
Crystal
�
Series
Low-frequency
power conversion
and control systems
60 to 180 kW;
~40 kHz
PVD sputtering,
dual-cathode
reactive sputtering
Low and Mid
Frequency
PE and PEII Series
Power conversion
and control systems
1 to 60 kW; 40 kHz
Reactive and dual-
cathode sputtering,
CVD, PECVD,
desmearing
LFGS Series
1250 W; 40 to 500 kHz
Plasma vacuum
process source
and bias
RAS Split Inductor
Dual/redundant
anode sputtering
low-frequency/high-
frequency accessory
10 kW
Reactive sputtering
PDX
�
Series
Power conversion
and control systems
900 W to 8 kW;
235 to 460 kHz
Plasma vacuum
process source
and bias
p r o d u c t g u i d e
2 Type
Product Platform
Description
Range/Size
Application
Power Systems
(Continued)
RF and High
Frequency
Paramount
�
Series
Next-generation,
advanced power
conversion and
control systems with
Virtual Front Panel
(VFP) power system
monitoring and
analysis software
1.5 to 3 kW;
13.56 MHz �5%
Oxide, poly, and
metal etch; PECVD,
PVD
Apex
�
Series
Power conversion
and control systems
1.5 to 5.5 kW;
13.56 MHz
Oxide, poly, and
metal etch; PECVD,
HDCVD, PVD
Hilight Series
300 and 600 W;
13.56 MHz
Ovation Series
2.5 and 2.7 kW;
60 MHz
HFV
�
Series
5 and 8 kW; 2 MHz
Cesar
�
Series
300 W to 5 kW;
2, 4, 13.56, 27.12,
and 40.68 MHz
Match Networks
Navigator
�
Match
Network Series
Match network for
RF power systems
3.2 MHz up to 500 W
12.88 MHz up to 7 kW
13.56 MHz
(for applications
up to 10 kW)
40 MHz (for
applications
up to 4 kW)
60 MHz
(for applications
up to 5 kW)
Dual-frequency
options for
advanced processing
applications
(available
options include
2/13.56 MHz up to 2
kW, 13/60 MHz up to
2 kW, 2/60 MHz up
to 5 kW)
Oxide, poly, and
metal etch; PECVD,
HDCVD, PVD
VarioMatch Series
2 to 27 MHz
(for applications
up to 5 kW)
RF Instrumentation
Z'Scan
�
Sensor
RF metrology
350 kHz to 90 MHz
RF plasma vacuum
process systems
3 Type
Product Platform
Description
Range/Size
Application
Sources
Remote Plasma
Sources
Litmas
�
RPS 1501
and 3001 Series
Integrated high-
density plasma
sources
100 to 1500 W
100 to 3000 W
Wafer pre-clean,
photoresist
ashing, exhaust
gas abatement,
reactive gas assisted
deposition, ALD
Xstream
�
Series
(Not for sale or use in
the U.S. or Germany.
Please check with your
AE representative
regarding availability
in other countries.)
Integrated plasma
sources with active
matching network
1000 to 6000 W
1000 to 8000 W
CVD chamber clean
Thermal
Instrumentation
Thermal Sensing
Systems
OR4000T
Non-contact, high-
speed temperature
measurement
Temperature
measurement ranges
from 50 to 3500�C
(122 to 6332�F)
HDP-CVD, RTP,
MOCVD, or any
other semiconductor
application
requiring non-
contact temperature
measurement
OR4000E
Non-contact, high-
speed temperature
measurement with
real-time emissivity
correction
Temperature
measurement ranges
from 50 to 3500�C
(122 to 6332�F) with
real-time emissivity
compensation from
0.03 to 1.00
HDP-CVD, RTP,
MOCVD, UV cure,
or any other
semiconductor
application
requiring non-
contact, emissivity-
compensated
temperature
measurement
OR400T
Low-cost, single-
channel, precision
non-contact
temperature
measurement
Temperature
measurement ranges
from 50 to 3500�C
(122 to 6332�F)
PVD, PECVD,
LPCVD, metal/poly
etch, or any other
semiconductor
application
requiring non-
contact temperature
measurement
OR2000F
Non-contact
temperature
sensing systems
Temperature
monitoring from
50 to 2000�C
(122 to 3632�F)
HDP-CVD, RTP,
MOCVD, or any
other semiconductor
application
requiring non-
contact temperature
measurement
p r o d u c t g u i d e
4 Type
Product Platform
Description
Range/Size
Application
Flow Products
Thermal-Based MFCs
and MFMs
Aera
�
PI-980
�
Series
DeviceNet
�
,
ultra-high purity,
metal seals, MFC
crosstalk insensitive,
inlet pressure
insensitive,
fast response
10 sccm to 100 slm;
multi-gas, multi-
range models
Etch, PVD, CVD, or
other semiconductor
applications
requiring pressure-
insensitve
performance with
fast response
Aera
�
Transformer
Series
FC-DN780
FC-PA7800
DeviceNet
�

and digital MFCs,
ultra-high purity,
metal seals
10 sccm to 200 slm;
gas-specific or
multi-gas models
Most semiconductor
processes, fiber
optics, FPD
Aera
�
FC-D980 Series
Digital MFC,
ultra-high purity,
metal seals
3 sccm to 50 slm;
gas-specific or multi-
gas models
Aera
�
FC-D985 Series
Compact, digital
MFC, ultra-high
purity, metal seals
3 sccm to 30 slm;
gas-specific or multi-
gas models
Aera
�
FC-7800 Series
Analog MFC, high
purity, metal seals
3 sccm to 200 slm;
gas-specific
Most semiconductor
processes, fiber
optics, FPD
Aera
�
FC-780CHT
Series
High-temperature,
analog MFC, high
purity, metal seals
10 sccm to 50 slm
(for temperatures
up to 85�C [185�F])
Aera
�
FC-785 Series
Compact, analog
MFC, high purity,
metal seals
3 sccm to 50 slm;
gas-specific
Aera
�
FC-7700 Series
Analog MFC,
high purity,
elastomer seals
3 sccm to 1000 slm;
gas-specific
Semiconductor, FPD,
fiber optics
Pressure-Based MFCs
Aera
�
FC-P2000
Series
Analog MFC, high
purity, metal seals
2 to 10 sccm
SDS applications
Liquid MFCs
Aera
�
LX-1200C
Analog MFC, high
purity, metal seals
0.1 to 10 gm/min
(density dependant)
Where liquid flow
control is preferable
to the control of gas
or vapor
Vapor Delivery
Systems
Aera
�
GS-430,
GS-440
Large-capacity
thermal vaporizer
and delivery system
Up to six lines
simultaneously
at 90 gm/min each
Vaporized liquids,
optical fiber, silica
industries
Aera
�
AS-50, AS-60,
AS-70, AS-71, AS-92,
AS-102
Compact thermal
vaporizer and
delivery system with
reduced footprint
Designed for
assembly into
equipment
Vaporized liquids for
deposition processes
Aera
�
RS-90, RS-95,
RS-100
Vaporizer refill and
recharge systems
Up to ten lines
simultaneously
Pressure Control
Products
Aera
�
EPC100 Series
Exhaust pressure
controller (absolute
or differential)
Compact design
consisting of control
valve, controller, and
pressure sensor
Atmospheric
pressure diffusion
systems
5
p r o d u c t g u i d e p r o d u c t g u i d e
� Advanced Energy Industries, Inc. 2008
All rights reserved. Printed in U.S.A.
ENG-LNCD-200-13 0M 6/08
Advanced Energy
�
, Aera
�
, Apex
�
, Cesar
�
, Crystal
�
, Diamond , EWave
�
, HFV
�
, HPG , Litmas
�
, Navigator
�
, Ovation , PDX
�
, PI-980
�
, Pinnacle
�
, Transformer , VarioMatch , Xstream
�
, and
ZScan
�
are trademarks of Advanced Energy Industries, Inc. DeviceNet
�
is a registered trademark of the Open DeviceNet Vendor Association, Inc. (ODVA).
Advanced Energy Industries, Inc. 1625 Sharp Point Drive Fort Collins, Colorado 80525 U.S.A.
T: 800.446.9167 or +1.970.221.4670 F: +1.970.221.5583
support@aei.com www.advanced-energy.com
Please see www.advanced-energy.com for worldwide contact information.
To view AE's power systems portfolio, visit:
www.advanced-energy.com/en/Power_Systems.html
To view AEs flow management portfolio, visit:
www.advanced-energy.com/en/Flow_Management.html
To view AEs complete product portfolio, visit:
www.advanced-energy.com/en/Products.html
Specifications are subject to change without notice.