VENT & LOAD OPERATING PROCEDURE CHA Metal Evaporation System

System VENT & LOAD
OPERATING PROCEDURE
CHA Metal Evaporation System
Rev. 11/28/2001
Pre-Run Check
1. Ensure that the Cryo pump is on. The temperature should read
< 20°K.
2. Ensure that the CVC AVC-485 is in AUTO mode.
3. Ensure that the water-cooling valve is closed (fully clockwise).
4. Check the logbook and the side panel display for the present
materials in the system. If you change materials carefully note
the new material arrangement both in the logbook and on the
side panel.

Vent
1. Ensure the Automatic Valve Control is in
Auto.
2. Press VENT on the left side of the
Automatic Valve Control.
3. Wait for the VACUUM INDICATOR light
to turn off.
4. Turn and hold the HOIST switch in the
RAISE position. The bell jar will lift.
Release the HOIST switch once the bell jar has risen above the substrate holder.
Vent & Load Operating Procedure Page 1 Loading the Substrates
1. Place the correct substrate holder
onto the support ring
a. There are now three substrate
holders: a 3 wafer dome, a
4 wafer dome, and a square
drop-in (same as previous).
b. Remove the substrate holder
you want to use from the dry
box and place it on the
tabletop.
c. Load your substrates onto the
substrate holder. Place
dummy wafers into any
wafer positions that you are not using.
d. Pick up the substrate holder by placing the dome tool into the hole in the dome or the hole in
the angle on top of the square drop-in.
e. Using
the
dome tool, place the substrate holder into the system. Position the substrate
holder onto the support ring, pushing it back until the substrate holder rests against the posts on
the back of the support ring.
2. Check crystal life push #1 on
Keypad for LIFE, reading should be
< 15%.
a. There are now two crystals, one
above the substrate holders and one
beneath.
b. XTAL 1 is above the substrate
holder. This is active when the
shutter is open or closed.
c. XTAL 2 is beneath the substrate
holder. This is active IF you are
using a wafer dome and have left an
opening in the dome for the deposition to reach the XTAL.
NOTE: XTAL 2 is not
installed at this time.

Vent & Load Operating Procedure Page 2 3. Place your materials in the hearth.
4. OPEN the shutter and reach through the shutter opening to place the material in the hearth. Ensure
you know what direction to turn the hearth rotation to change the materials during the deposition.
5. Clean or replace mirror. Pull the mirror up and out of the metal mirror holder, DO NOT loosen
the metal mirror holders
6. Close the shutter under the substrate. Ensure that you
understand the proper direction to turn the shutter handle.
7. Turn and hold the HOIST switch in the LOWER position.
The bell jar will lower. Release the HOIST switch once the
bell jar is resting on the collar. Center the bell jar on the collar.

Pump down
1. Using the controller labeled CVC AVC-485:
Press START on the Automatic Valve Control
Wait (typically 2 hours) for the system to reach a low base pressure (less than 2.1e-6).
2. The base pressure can be checked on the Ion Gauge Controller.
Press the FILAMENT ON/OFF switch to light the filament.
Read the pressure on the display above the switch.
3. Place System In Use card in and record in logbook.


LOG BOOK RECORD

You are to record the follow information in the logbook:

1. Name and date.
2. Time
in.
3. Pressure at start of deposition
4. Material (s) deposited
5. Parameters of deposition such as current, deposition rate
and thickness of deposition.
6. Time
out.
Dome holder
Crystal
Monitor
Mirrors
Hearth
Vent & Load Operating Procedure Page 3